Method and apparatus for fast and local anneal of anti-ferromagnetic (AF) exchange-biased magnetic stacks

Method and apparatus for fast and local anneal of anti-ferromagnetic (AF) exchange-biased magnetic stacks

A method (and structure) of thermally treating a magnetic layer of a wafer, includes annealing, for a predetermined short duration, a magnetic layer of a single wafer.

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Bibliographische Detailangaben
Hauptverfasser: Klostermann, Ulrich Karl, Raberg, Wolfgang, Trouilloud, Philip
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method (and structure) of thermally treating a magnetic layer of a wafer, includes annealing, for a predetermined short duration, a magnetic layer of a single wafer.