Method of inhibiting photoresist pattern collapse

Method of inhibiting photoresist pattern collapse

A method of inhibiting photoresist pattern collapse which includes the steps of providing a substrate; providing a photoresist layer on the substrate; exposing and developing the photoresist layer; applying a top anti-reflective coating layer to the photoresist layer; rinsing the photoresist layer;...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Chang, Ching-Yu, Lee, Heng-Jen, Lin, Chin-Hsiang, Lin, Hua-Tai, Chen, Kuei Shun, Ho, Bang-Chein, Turn, Li-Kong, Kuo, Hung-Jui, Kao, Ko-Bin, Chien, Tsung-Chih
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of inhibiting photoresist pattern collapse which includes the steps of providing a substrate; providing a photoresist layer on the substrate; exposing and developing the photoresist layer; applying a top anti-reflective coating layer to the photoresist layer; rinsing the photoresist layer; and drying the photoresist layer.