Method of evaluating optical beam source of exposure device, method of designing illumination shape of exposure device, and software for optimizing illumination shape of exposure device

A method of evaluating an exposure optical beam source of an exposure device used in an exposure process in manufacturing a semiconductor device is disclosed, in which the method includes dividing an exposure optical beam source into a plurality of unit optical beam sources in a unit size determined by an exposure device, acquiring a difference between an evaluation amount of a target pattern on a semiconductor substrate when a unit optical beam source is turned on and an evaluation amount of the target pattern on the semiconductor substrate when the unit optical beam source is turned off, and evaluating the exposure optical beam source by using the acquired difference as an index.