Method and apparatus for angular-resolved spectroscopic lithography characterization

Method and apparatus for angular-resolved spectroscopic lithography characterization

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity o...

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Hauptverfasser: Den Boef, Arie Jeffrey Maria, Bleeker, Arno Jan, Van Dommelen, Youri Johannes Laurentius Maria, Dusa, Mircea, Kiers, Antoine Gaston Marie, Luehrmann, Paul Frank, Pellemans, Henricus Petrus Maria, Van Der Schaar, Maurits, Grouwstra, Cedric Desire, Van Kraaij, Markus Gerardus Martinus
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.