Method for prediction of premature dielectric breakdown in a semiconductor

The invention predicts premature dielectric breakdown in a semiconductor. At least one dielectric breakdown mode is calculated for a layer within chips comprising a semiconductor wafer lot. If only one mode is calculated, that is the best calculated mode. If multiple modes can be calculated, a best...

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Bibliographische Detailangaben
Hauptverfasser: Chanda, Kaushik, Rathore, Hazara S, McLaughlin, Paul S, Edwards, Robert D, Clevenger, Lawrence A, Cowley, Andrew P, Yang, Chih-Chao, Barile, Conrad A
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The invention predicts premature dielectric breakdown in a semiconductor. At least one dielectric breakdown mode is calculated for a layer within chips comprising a semiconductor wafer lot. If only one mode is calculated, that is the best calculated mode. If multiple modes can be calculated, a best mode that most accurately represents dielectric breakdown for the semiconductor wafer lot is determined. Premature dielectric breakdown will be associated with any semiconductor with a breakdown voltage less than a predetermined standard deviation from the best calculated mode.