Operating a plasma process

A method for operating one or more plasma processes in a plasma chamber, with at least two power supplies, the method comprising the following process steps: transferring the at least one signal and/or the data to a plasma process-regulating device and/or to one or more other power supplies or to on...

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Bibliographische Detailangaben
1. Verfasser: Nitschke, Moritz
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method for operating one or more plasma processes in a plasma chamber, with at least two power supplies, the method comprising the following process steps: transferring the at least one signal and/or the data to a plasma process-regulating device and/or to one or more other power supplies or to one or more of the arc diverter devices associated with the other power supplies.