Plasma reactor for processing a workpiece and having a tunable cathode

A plasma reactor is provided for processing a workpiece such as a transparent mask or a semiconductor wafer. The reactor includes a vacuum chamber having a ceiling and a sidewall. A workpiece support pedestal within the chamber includes a metal cathode having a support surface facing the ceiling and...

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Hauptverfasser:	Lewington, Richard, Grimbergen, Michael N, Nguyen, Khiem K, Bivens, Darin, Chandrachood, Madhavi R, Kumar, Ajay
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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