Plasma reactor for processing a workpiece and having a tunable cathode

Plasma reactor for processing a workpiece and having a tunable cathode

A plasma reactor is provided for processing a workpiece such as a transparent mask or a semiconductor wafer. The reactor includes a vacuum chamber having a ceiling and a sidewall. A workpiece support pedestal within the chamber includes a metal cathode having a support surface facing the ceiling and...

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Hauptverfasser: Lewington, Richard, Grimbergen, Michael N, Nguyen, Khiem K, Bivens, Darin, Chandrachood, Madhavi R, Kumar, Ajay
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Sprache:eng
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creator Lewington, Richard
Grimbergen, Michael N
Nguyen, Khiem K
Bivens, Darin
Chandrachood, Madhavi R
Kumar, Ajay
description A plasma reactor is provided for processing a workpiece such as a transparent mask or a semiconductor wafer. The reactor includes a vacuum chamber having a ceiling and a sidewall. A workpiece support pedestal within the chamber includes a metal cathode having a support surface facing the ceiling and defining a support plane for supporting a workpiece. The cathode has a hollow space formed within its interior. The reactor further includes a movable metal element within the hollow space and a mechanism for controlling a distance between the metal element and the support plane.
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title Plasma reactor for processing a workpiece and having a tunable cathode
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