Lithographic apparatus, and device manufacturing method

A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to re...

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Bibliographische Detailangaben
Hauptverfasser:	Van Herpen, Maarten Marinus Johannes Wilhelmus, Banine, Vadim Yevgenyevich, De Kuster, Johannes Peterus Henricus, Moors, Johannes Hubertus Josephina, Stevens, Lucas Henricus Johannes, Wolschrijn, Bastiaan Theodoor, Sidelnikov, Yurii Victorovitch, Van der Velden, Marc Hubertus Lorenz, Soer, Wouter Anthon, Stein, Thomas, Gielissen, Kurt
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.