Nitrogen-containing organosilicon compound method of manufacture, and method of treating surfaces

121 2 A new nitrogen-containing organosilicon compound contains tertiary amine groups and carbonyl groups wherein the tertiary amine groups are selected from RRN- (where Rand Rare the same or different univalent hydrocarbon groups of 1-15 carbon atoms), alicyclic amino groups, or heterocyclic amino...

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Bibliographische Detailangaben
Hauptverfasser: Iwai, Makoto, Hamada, Mitsuyoshi
Format: Patent
Sprache:eng
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Zusammenfassung:121 2 A new nitrogen-containing organosilicon compound contains tertiary amine groups and carbonyl groups wherein the tertiary amine groups are selected from RRN- (where Rand Rare the same or different univalent hydrocarbon groups of 1-15 carbon atoms), alicyclic amino groups, or heterocyclic amino groups containing in their rings one or more tertiary amine groups.