Lithographic apparatus and device manufacturing method
A lithographic apparatus is disclosed that includes a utility substrate storage configured to hold a utility substrate, and a utility substrate scheduling unit configured to schedule the loading of a utility substrate in a flow of substrates in the lithographic apparatus.
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Zusammenfassung: | A lithographic apparatus is disclosed that includes a utility substrate storage configured to hold a utility substrate, and a utility substrate scheduling unit configured to schedule the loading of a utility substrate in a flow of substrates in the lithographic apparatus. |
|---|