Graded spin-on organic antireflective coating for photolithography

Graded spin-on organic antireflective coating for photolithography

An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.

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Bibliographische Detailangaben
Hauptverfasser: Brodsky, Colin J, Burns, Sean D, Goldfarb, Dario L, Lercel, Michael, Medeiros, David R, Pfeiffer, Dirk, Sanders, Daniel P, Scheer, Steven A, Vyklicky, Libor
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
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Beschreibung
Zusammenfassung:An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.