Silicon-doped carbon dielectrics

A silicone-doped carbon interlayer dielectric (ILD) and its method of formation are disclosed. The ILD's dielectric constant and/or its mechanical strength can be tailored by varying the ratio of carbon-to-silicon in the silicon-doped carbon matrix.

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Bibliographische Detailangaben
Hauptverfasser: Goodner, Michael D, Antonelli, George A
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A silicone-doped carbon interlayer dielectric (ILD) and its method of formation are disclosed. The ILD's dielectric constant and/or its mechanical strength can be tailored by varying the ratio of carbon-to-silicon in the silicon-doped carbon matrix.