Ampoule for liquid draw and vapor draw with a continuous level sensor
A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vap...
Gespeichert in:
Hauptverfasser: | , , , , , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | Choi, Kenric T Narwankar, Pravin K Kher, Shreyas S Nguyen, Son T Deaton, Paul Ngo, Khai Chhabra, Paul Ouye, Alan H Wu, Dien-Yeh (Daniel) |
description | A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vaporizer coupled to the process chamber, or a vaporized or gaseous precursor material to the process chamber. The ampoule also includes a continuous level sensor to accurately monitor the level of precursor source material within the ampoule. |
format | Patent |
fullrecord | <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_07775508</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>07775508</sourcerecordid><originalsourceid>FETCH-uspatents_grants_077755083</originalsourceid><addsrcrecordid>eNrjZHB1zC3IL81JVUjLL1LIySwszUxRSClKLFdIzEtRKEssAIqCueWZJRkKiQrJ-XklmXml-aXFCjmpZak5CsWpecX5RTwMrGmJOcWpvFCam0HBzTXE2UO3tLggsSQ1r6Q4Pr0oEUQZmJubm5oaWBgToQQAoBw0Bw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Ampoule for liquid draw and vapor draw with a continuous level sensor</title><source>USPTO Issued Patents</source><creator>Choi, Kenric T ; Narwankar, Pravin K ; Kher, Shreyas S ; Nguyen, Son T ; Deaton, Paul ; Ngo, Khai ; Chhabra, Paul ; Ouye, Alan H ; Wu, Dien-Yeh (Daniel)</creator><creatorcontrib>Choi, Kenric T ; Narwankar, Pravin K ; Kher, Shreyas S ; Nguyen, Son T ; Deaton, Paul ; Ngo, Khai ; Chhabra, Paul ; Ouye, Alan H ; Wu, Dien-Yeh (Daniel) ; Applied Materials, Inc</creatorcontrib><description>A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vaporizer coupled to the process chamber, or a vaporized or gaseous precursor material to the process chamber. The ampoule also includes a continuous level sensor to accurately monitor the level of precursor source material within the ampoule.</description><language>eng</language><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7775508$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,778,800,883,64020</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7775508$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Choi, Kenric T</creatorcontrib><creatorcontrib>Narwankar, Pravin K</creatorcontrib><creatorcontrib>Kher, Shreyas S</creatorcontrib><creatorcontrib>Nguyen, Son T</creatorcontrib><creatorcontrib>Deaton, Paul</creatorcontrib><creatorcontrib>Ngo, Khai</creatorcontrib><creatorcontrib>Chhabra, Paul</creatorcontrib><creatorcontrib>Ouye, Alan H</creatorcontrib><creatorcontrib>Wu, Dien-Yeh (Daniel)</creatorcontrib><creatorcontrib>Applied Materials, Inc</creatorcontrib><title>Ampoule for liquid draw and vapor draw with a continuous level sensor</title><description>A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vaporizer coupled to the process chamber, or a vaporized or gaseous precursor material to the process chamber. The ampoule also includes a continuous level sensor to accurately monitor the level of precursor source material within the ampoule.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZHB1zC3IL81JVUjLL1LIySwszUxRSClKLFdIzEtRKEssAIqCueWZJRkKiQrJ-XklmXml-aXFCjmpZak5CsWpecX5RTwMrGmJOcWpvFCam0HBzTXE2UO3tLggsSQ1r6Q4Pr0oEUQZmJubm5oaWBgToQQAoBw0Bw</recordid><startdate>20100817</startdate><enddate>20100817</enddate><creator>Choi, Kenric T</creator><creator>Narwankar, Pravin K</creator><creator>Kher, Shreyas S</creator><creator>Nguyen, Son T</creator><creator>Deaton, Paul</creator><creator>Ngo, Khai</creator><creator>Chhabra, Paul</creator><creator>Ouye, Alan H</creator><creator>Wu, Dien-Yeh (Daniel)</creator><scope>EFH</scope></search><sort><creationdate>20100817</creationdate><title>Ampoule for liquid draw and vapor draw with a continuous level sensor</title><author>Choi, Kenric T ; Narwankar, Pravin K ; Kher, Shreyas S ; Nguyen, Son T ; Deaton, Paul ; Ngo, Khai ; Chhabra, Paul ; Ouye, Alan H ; Wu, Dien-Yeh (Daniel)</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_077755083</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2010</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Choi, Kenric T</creatorcontrib><creatorcontrib>Narwankar, Pravin K</creatorcontrib><creatorcontrib>Kher, Shreyas S</creatorcontrib><creatorcontrib>Nguyen, Son T</creatorcontrib><creatorcontrib>Deaton, Paul</creatorcontrib><creatorcontrib>Ngo, Khai</creatorcontrib><creatorcontrib>Chhabra, Paul</creatorcontrib><creatorcontrib>Ouye, Alan H</creatorcontrib><creatorcontrib>Wu, Dien-Yeh (Daniel)</creatorcontrib><creatorcontrib>Applied Materials, Inc</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Choi, Kenric T</au><au>Narwankar, Pravin K</au><au>Kher, Shreyas S</au><au>Nguyen, Son T</au><au>Deaton, Paul</au><au>Ngo, Khai</au><au>Chhabra, Paul</au><au>Ouye, Alan H</au><au>Wu, Dien-Yeh (Daniel)</au><aucorp>Applied Materials, Inc</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Ampoule for liquid draw and vapor draw with a continuous level sensor</title><date>2010-08-17</date><risdate>2010</risdate><abstract>A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vaporizer coupled to the process chamber, or a vaporized or gaseous precursor material to the process chamber. The ampoule also includes a continuous level sensor to accurately monitor the level of precursor source material within the ampoule.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_uspatents_grants_07775508 |
source | USPTO Issued Patents |
title | Ampoule for liquid draw and vapor draw with a continuous level sensor |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-16T14%3A30%3A38IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Choi,%20Kenric%20T&rft.aucorp=Applied%20Materials,%20Inc&rft.date=2010-08-17&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E07775508%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |