Ampoule for liquid draw and vapor draw with a continuous level sensor

Ampoule for liquid draw and vapor draw with a continuous level sensor

A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vap...

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Bibliographische Detailangaben
Hauptverfasser: Choi, Kenric T, Narwankar, Pravin K, Kher, Shreyas S, Nguyen, Son T, Deaton, Paul, Ngo, Khai, Chhabra, Paul, Ouye, Alan H, Wu, Dien-Yeh (Daniel)
Format: Patent
Sprache:eng
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Zusammenfassung:A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vaporizer coupled to the process chamber, or a vaporized or gaseous precursor material to the process chamber. The ampoule also includes a continuous level sensor to accurately monitor the level of precursor source material within the ampoule.