Atomic layer deposition of tantalum-containing films using surface-activating agents and novel tantalum complexes
Atomic layer deposition processes for the formation of tantalum-containing films on surfaces are provided. Also provided are novel tantalum complexes that can be used as tantalum precursors in the disclosed deposition processes.
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | Atomic layer deposition processes for the formation of tantalum-containing films on surfaces are provided. Also provided are novel tantalum complexes that can be used as tantalum precursors in the disclosed deposition processes. |
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