Stacked wafer or die packaging with enhanced thermal and device performance

An apparatus includes a metallization region including a plurality of metal layers on a device layer of a substrate, a via extending through the substrate and the device layer, and a heat spreading and stress engineering region in the substrate and adjacent to the device layer. The via contacts a me...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Baskaran, Rajashree, Ramanathan, Shriram, Morrow, Patrick R
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An apparatus includes a metallization region including a plurality of metal layers on a device layer of a substrate, a via extending through the substrate and the device layer, and a heat spreading and stress engineering region in the substrate and adjacent to the device layer. The via contacts a metal layer in the metallization region.