Process for producing patterned optical filter layers on substrates
The invention provides a process for producing at least one optical filter layer segment on a substrate. The process includes The deposition of the optical filter layer, at least at times, takes place at a temperature of over 150° C., preferably in a range from over 150° C. up to and including 400°...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | The invention provides a process for producing at least one optical filter layer segment on a substrate. The process includes The deposition of the optical filter layer, at least at times, takes place at a temperature of over 150° C., preferably in a range from over 150° C. up to and including 400° C. |
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