Design data creating method, design data creating program product, and manufacturing method of semiconductor device

According to an aspect of the invention, there is provided a design data creating method of creating design data of a semiconductor device including extracting an AND region of an upper layer wiring pattern and a lower layer wiring pattern that sandwich a contact hole layer pattern included in a pat...

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Bibliographische Detailangaben
1. Verfasser: Kyoh, Suigen
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:According to an aspect of the invention, there is provided a design data creating method of creating design data of a semiconductor device including extracting an AND region of an upper layer wiring pattern and a lower layer wiring pattern that sandwich a contact hole layer pattern included in a pattern layer, extracting the contact hole layer pattern included in the AND region, and moving the contact hole layer pattern in such a manner that the center of the AND region coincides with the center of the contact hole layer pattern.