Process for separating zirconium and hafnium

The present invention provides a new process for separating zirconium and hafnium compounds, in particular to remove traces of zirconium compounds from hafnium compounds, using fractional crystallisation, as well as hafnium compounds obtainable in accordance with this process.

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Bibliographische Detailangaben
Hauptverfasser: Reuter, Knud, Passing, Gerd, Kirchmeyer, Stephan
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention provides a new process for separating zirconium and hafnium compounds, in particular to remove traces of zirconium compounds from hafnium compounds, using fractional crystallisation, as well as hafnium compounds obtainable in accordance with this process.