Composition and associated method

A composition includes a metal precursor. The metal precursor may include an inorganic ligand and a metal cation. The inorganic ligand may include a carbamate group. An associated method is provided.

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Bibliographische Detailangaben
Hauptverfasser:	Simone, Davide Louis, Angeliu, Thomas Martin, Zhang, Jian, Carter, Christopher Michael, Gibson, III, David Alexander, Lewis, Larry Neil
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	A composition includes a metal precursor. The metal precursor may include an inorganic ligand and a metal cation. The inorganic ligand may include a carbamate group. An associated method is provided.