Photosensitive resin, photosensitive composition and photo-crosslinked structure
1 2 3 4 3 4 5 The invention provides a photosensitive resin which can readily form, through photo-crosslinking, a surface coating which has hydrophilicity and high bioadaptability; a photosensitive composition containing the photosensitive resin; and a photo-crosslinked structure obtained from the p...
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creator | Ikeya, Takeshi Shibuya, Toru Miyazaki, Kana |
description | 1 2 3 4 3 4 5 The invention provides a photosensitive resin which can readily form, through photo-crosslinking, a surface coating which has hydrophilicity and high bioadaptability; a photosensitive composition containing the photosensitive resin; and a photo-crosslinked structure obtained from the photosensitive composition.The photosensitive resin is represented by the following formula (1): (wherein n represents a mean polymerization degree and is 5 or more; Rand R, which may be identical to or different from each other, each represent an alkylene group, an arylene group, an oxyalkylene group, or a single bond; each of X and Y represents a photosensitive unit represented by the following formula (2): or either one of X and Y represents a photosensitive unit represented by the above formula (2) and the other represents an amino group; Rrepresents a group selected from among the groups represented by the following formula set (3): Rrepresents a group selected from among the groups represented by the following formula set (4): at least one of Rand Rhas at least one azido group; and Rrepresents a hydrogen atom, an alkyl group, an acetal-group-containing alkyl group, an aryl group, an aralkyl group, or a substituent containing a base-forming nitrogen atom). |
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a photosensitive composition containing the photosensitive resin; and a photo-crosslinked structure obtained from the photosensitive composition.The photosensitive resin is represented by the following formula (1): (wherein n represents a mean polymerization degree and is 5 or more; Rand R, which may be identical to or different from each other, each represent an alkylene group, an arylene group, an oxyalkylene group, or a single bond; each of X and Y represents a photosensitive unit represented by the following formula (2): or either one of X and Y represents a photosensitive unit represented by the above formula (2) and the other represents an amino group; Rrepresents a group selected from among the groups represented by the following formula set (3): Rrepresents a group selected from among the groups represented by the following formula set (4): at least one of Rand Rhas at least one azido group; and Rrepresents a hydrogen atom, an alkyl group, an acetal-group-containing alkyl group, an aryl group, an aralkyl group, or a substituent containing a base-forming nitrogen atom).</description><language>eng</language><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7605191$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,780,802,885,64039</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7605191$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Ikeya, Takeshi</creatorcontrib><creatorcontrib>Shibuya, Toru</creatorcontrib><creatorcontrib>Miyazaki, Kana</creatorcontrib><creatorcontrib>Toyo Gosei Co., Ltd</creatorcontrib><title>Photosensitive resin, photosensitive composition and photo-crosslinked structure</title><description>1 2 3 4 3 4 5 The invention provides a photosensitive resin which can readily form, through photo-crosslinking, a surface coating which has hydrophilicity and high bioadaptability; a photosensitive composition containing the photosensitive resin; and a photo-crosslinked structure obtained from the photosensitive composition.The photosensitive resin is represented by the following formula (1): (wherein n represents a mean polymerization degree and is 5 or more; Rand R, which may be identical to or different from each other, each represent an alkylene group, an arylene group, an oxyalkylene group, or a single bond; each of X and Y represents a photosensitive unit represented by the following formula (2): or either one of X and Y represents a photosensitive unit represented by the above formula (2) and the other represents an amino group; Rrepresents a group selected from among the groups represented by the following formula set (3): Rrepresents a group selected from among the groups represented by the following formula set (4): at least one of Rand Rhas at least one azido group; and Rrepresents a hydrogen atom, an alkyl group, an acetal-group-containing alkyl group, an aryl group, an aralkyl group, or a substituent containing a base-forming nitrogen atom).</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZAgIyMgvyS9OzSvOLMksS1UoSi3OzNNRKEAVTc7PLcgHsfPzFBLzUiDSuslF-cXFOZl52akpCsUlRaXJJaVFqTwMrGmJOcWpvFCam0HBzTXE2UO3tLggsSQ1r6Q4Pr0oEUQZmJsZmBpaGhoToQQAKlY55A</recordid><startdate>20091020</startdate><enddate>20091020</enddate><creator>Ikeya, Takeshi</creator><creator>Shibuya, Toru</creator><creator>Miyazaki, Kana</creator><scope>EFH</scope></search><sort><creationdate>20091020</creationdate><title>Photosensitive resin, photosensitive composition and photo-crosslinked structure</title><author>Ikeya, Takeshi ; Shibuya, Toru ; Miyazaki, Kana</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_076051913</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2009</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Ikeya, Takeshi</creatorcontrib><creatorcontrib>Shibuya, Toru</creatorcontrib><creatorcontrib>Miyazaki, Kana</creatorcontrib><creatorcontrib>Toyo Gosei Co., Ltd</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Ikeya, Takeshi</au><au>Shibuya, Toru</au><au>Miyazaki, Kana</au><aucorp>Toyo Gosei Co., Ltd</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Photosensitive resin, photosensitive composition and photo-crosslinked structure</title><date>2009-10-20</date><risdate>2009</risdate><abstract>1 2 3 4 3 4 5 The invention provides a photosensitive resin which can readily form, through photo-crosslinking, a surface coating which has hydrophilicity and high bioadaptability; a photosensitive composition containing the photosensitive resin; and a photo-crosslinked structure obtained from the photosensitive composition.The photosensitive resin is represented by the following formula (1): (wherein n represents a mean polymerization degree and is 5 or more; Rand R, which may be identical to or different from each other, each represent an alkylene group, an arylene group, an oxyalkylene group, or a single bond; each of X and Y represents a photosensitive unit represented by the following formula (2): or either one of X and Y represents a photosensitive unit represented by the above formula (2) and the other represents an amino group; Rrepresents a group selected from among the groups represented by the following formula set (3): Rrepresents a group selected from among the groups represented by the following formula set (4): at least one of Rand Rhas at least one azido group; and Rrepresents a hydrogen atom, an alkyl group, an acetal-group-containing alkyl group, an aryl group, an aralkyl group, or a substituent containing a base-forming nitrogen atom).</abstract><oa>free_for_read</oa></addata></record> |
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title | Photosensitive resin, photosensitive composition and photo-crosslinked structure |
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