Photosensitive resin, photosensitive composition and photo-crosslinked structure

1 2 3 4 3 4 5 The invention provides a photosensitive resin which can readily form, through photo-crosslinking, a surface coating which has hydrophilicity and high bioadaptability; a photosensitive composition containing the photosensitive resin; and a photo-crosslinked structure obtained from the p...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Ikeya, Takeshi, Shibuya, Toru, Miyazaki, Kana
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:1 2 3 4 3 4 5 The invention provides a photosensitive resin which can readily form, through photo-crosslinking, a surface coating which has hydrophilicity and high bioadaptability; a photosensitive composition containing the photosensitive resin; and a photo-crosslinked structure obtained from the photosensitive composition.The photosensitive resin is represented by the following formula (1): (wherein n represents a mean polymerization degree and is 5 or more; Rand R, which may be identical to or different from each other, each represent an alkylene group, an arylene group, an oxyalkylene group, or a single bond; each of X and Y represents a photosensitive unit represented by the following formula (2): or either one of X and Y represents a photosensitive unit represented by the above formula (2) and the other represents an amino group; Rrepresents a group selected from among the groups represented by the following formula set (3): Rrepresents a group selected from among the groups represented by the following formula set (4): at least one of Rand Rhas at least one azido group; and Rrepresents a hydrogen atom, an alkyl group, an acetal-group-containing alkyl group, an aryl group, an aralkyl group, or a substituent containing a base-forming nitrogen atom).