Apparatus, system, and method for determining a time-temperature history of an aftertreatment device

Apparatus, system, and method for determining a time-temperature history of an aftertreatment device

An apparatus, system, and method are disclosed for determining a time-temperature history of an aftertreatment device. The apparatus includes an aftertreatment device comprising a substrate, and at least one thermal monitoring member (TMM) in thermal contact with the substrate. The TMMs may comprise...

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Hauptverfasser: Yonushonis, Thomas M, Stafford, Randall J, Simon, III, Conrad J, Blackwell, Bryan E, Westerson, Kevin
Format: Patent
Sprache:eng
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Zusammenfassung:An apparatus, system, and method are disclosed for determining a time-temperature history of an aftertreatment device. The apparatus includes an aftertreatment device comprising a substrate, and at least one thermal monitoring member (TMM) in thermal contact with the substrate. The TMMs may comprise a material that exhibits an electrical resistivity change at temperature over time. The apparatus may include a controller configured to measure the electrical resistivity of at least a portion of the TMMs, and to determine a thermal history based on the electrical resistivity measures.