Microlithographic projection exposure apparatus

A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Dodoc, Aurelian, Schuster, Karl Heinz, Mallmann, Joerg, Ulrich, Wilhelm, Rostalski, Hans-Juergen, Holderer, Hubert, Gellrich, Bernhard, Fischer, Juergen, Beder, Susanne, Wurmbrand, Andreas, Loering, Ulrich, Ranck, Albrecht
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.