Lithographic apparatus with gas bearing supply mechanism and device manufacturing method
A lithographic apparatus is disclosed that has a track comprising a plurality of gas outflow openings positioned along the track. A gas conduit is configured to feed pressurized gas to the gas outflow openings to form a gas bearing configured to moveably bear an object along the track. Further, a ga...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A lithographic apparatus is disclosed that has a track comprising a plurality of gas outflow openings positioned along the track. A gas conduit is configured to feed pressurized gas to the gas outflow openings to form a gas bearing configured to moveably bear an object along the track. Further, a gas flow device is provided that is configured to cause or prevent flow of gas through one or more of the gas outflow openings dependent on a position of a guide surface of the object with respect to the gas outflow openings. |
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