Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same

1234 121 2 A photoresist composition includes a novolac resin having where each of R, R, R, and Ris an alkyl group having a hydrogen atom or between one through six carbon atoms and n is an integer ranging from zero through three; and a mercapto compound having Z-SH, or SH-Z-SH, where each of Zand Z...

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Hauptverfasser:	Park, Jeong-Min, Ryu, Mi-Sun, Lee, Hi-Kuk, Jeon, Woo-Seok
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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