Microlithographic projection exposure apparatus

aaaA microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L; L; L; L; L; L; L; L) of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection light is fastened between the final lens element on the image side and the light-sensitive layer.