Method and apparatus for the improvement of material/voltage contrast

Method and apparatus for the improvement of material/voltage contrast

2A method and system for registering a CAD layout to a Focused Ion Beam image for through-the substrate probing, without using an optical image and without requiring biasing, includes an improved method of trench endpointing during the FIB milling operation with a low beam energy. The method further...

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Bibliographische Detailangaben
Hauptverfasser: Le Roy, Erwan, Thompson, William B
Format: Patent
Sprache:eng
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Zusammenfassung:2A method and system for registering a CAD layout to a Focused Ion Beam image for through-the substrate probing, without using an optical image and without requiring biasing, includes an improved method of trench endpointing during the FIB milling operation with a low beam energy. The method further includes removal of Ga at the trench floor using XeF, as well as the deposition of an insulating layer onto the trench floor.