Imaging device in a projection exposure machine

An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part...

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Bibliographische Detailangaben
Hauptverfasser:	Back, Stephan, Hummel, Wolfgang, Fischer, Juergen, Aubele, Karl-Eugen, Merz, Erich, Reiner, Raoul, Rief, Klaus, Schoengart, Stefan, Neumaier, Markus, Schwaer, Baerbel, Weber, Ulrich, Muehlbeyer, Michael, Holderer, Hubert, Kohl, Alexander, Weber, Jochen, Lippert, Johannes, Rassel, Thorsten
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.