Etch before grind for semiconductor die singulation

Methods are provided, and devices made by such methods. One of the methods includes procuring a semiconductor wafer, processing the wafer to form a plurality of circuits on a top side, forming trenches on the top side between the adjacent circuits, forming a trench passivation layer on side walls of...

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Bibliographische Detailangaben
Hauptverfasser: Paulsen, Ronald E, Koepp, Ronald L, Ma, Yanjun, Morrell, Larry, Horch, Andrew E
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Methods are provided, and devices made by such methods. One of the methods includes procuring a semiconductor wafer, processing the wafer to form a plurality of circuits on a top side, forming trenches on the top side between the adjacent circuits, forming a trench passivation layer on side walls of the trenches, forming conductive bumps on the top side of the wafer; and removing material from the bottom side to thin the wafer, and eventually separate the wafer along the trenches into dies, where each die includes only one of the circuits.