Semiconductor device and method for producing the same

A semiconductor device, including a first MIS-type transistor formed in a first region of a semiconductor region, the first region being of a first conductivity type, the first MIS-type transistor including: a first gate insulating film formed on the first region; a first gate electrode formed on the first gate insulating film; a first extension diffusion layer of a second conductivity type formed in a region of the first region under and beside the first gate electrode; and a first fluorine diffusion layer formed in a first channel region of the first conductivity type sandwiched between portions of the first extension diffusion layer, wherein portions of the first fluorine diffusion layer extend from the first extension diffusion layer and overlap together in a region directly under the first gate electrode.