Cleaning method and solution for cleaning a wafer in a single wafer process

42222The present invention is a novel cleaning method and a solution for use in a single wafer cleaning process. According to the present invention the cleaning solution comprises ammonium hydroxide (NHOH), hydrogen peroxide (HO), water (HO) and a chelating agent. In an embodiment of the present inv...

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Bibliographische Detailangaben

Hauptverfasser:	Verhaverbeke, Steven, Truman, J. Kelly
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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