Structure for monitoring semiconductor polysilicon gate profile
Detection of a profile drift of a polysilicon line is enhanced by a test structure that measures a bottom width and an average width of a cross sectional area of the same polysilicon line correlates the two measurements, and compares such correlation with a previous correlation of bottom width to av...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Detection of a profile drift of a polysilicon line is enhanced by a test structure that measures a bottom width and an average width of a cross sectional area of the same polysilicon line correlates the two measurements, and compares such correlation with a previous correlation of bottom width to average width of cross sectional area of the same polysilicon line. |
---|