Semiconductor component with a MOS transistor

The source area is highly doped, like the channel area, for the same conductance type. The drain area is doped for the opposite conductance type. This results in a saving of area since the source connection (S) can at the same time be used as the well connection or substrate connection.

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Hauptverfasser: Schnabel, Rainer Florian, Sommer, Michael Bernhard
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Sprache:eng
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creator Schnabel, Rainer Florian
Sommer, Michael Bernhard
description The source area is highly doped, like the channel area, for the same conductance type. The drain area is doped for the opposite conductance type. This results in a saving of area since the source connection (S) can at the same time be used as the well connection or substrate connection.
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fullrecord <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_07355218</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>07355218</sourcerecordid><originalsourceid>FETCH-uspatents_grants_073552183</originalsourceid><addsrcrecordid>eNrjZNANTs3NTM7PSylNLskvUkjOzy3Iz0vNK1EozyzJUEhU8PUPVigpSswrziwGyvMwsKYl5hSn8kJpbgYFN9cQZw_d0uKCxBKgtuL4dKBiIGVgbmxqamRoYUyEEgC0QCs3</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Semiconductor component with a MOS transistor</title><source>USPTO Issued Patents</source><creator>Schnabel, Rainer Florian ; Sommer, Michael Bernhard</creator><creatorcontrib>Schnabel, Rainer Florian ; Sommer, Michael Bernhard ; Infineon Technologies AG</creatorcontrib><description>The source area is highly doped, like the channel area, for the same conductance type. The drain area is doped for the opposite conductance type. This results in a saving of area since the source connection (S) can at the same time be used as the well connection or substrate connection.</description><language>eng</language><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7355218$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,780,802,885,64039</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7355218$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Schnabel, Rainer Florian</creatorcontrib><creatorcontrib>Sommer, Michael Bernhard</creatorcontrib><creatorcontrib>Infineon Technologies AG</creatorcontrib><title>Semiconductor component with a MOS transistor</title><description>The source area is highly doped, like the channel area, for the same conductance type. The drain area is doped for the opposite conductance type. This results in a saving of area since the source connection (S) can at the same time be used as the well connection or substrate connection.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZNANTs3NTM7PSylNLskvUkjOzy3Iz0vNK1EozyzJUEhU8PUPVigpSswrziwGyvMwsKYl5hSn8kJpbgYFN9cQZw_d0uKCxBKgtuL4dKBiIGVgbmxqamRoYUyEEgC0QCs3</recordid><startdate>20080408</startdate><enddate>20080408</enddate><creator>Schnabel, Rainer Florian</creator><creator>Sommer, Michael Bernhard</creator><scope>EFH</scope></search><sort><creationdate>20080408</creationdate><title>Semiconductor component with a MOS transistor</title><author>Schnabel, Rainer Florian ; Sommer, Michael Bernhard</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_073552183</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Schnabel, Rainer Florian</creatorcontrib><creatorcontrib>Sommer, Michael Bernhard</creatorcontrib><creatorcontrib>Infineon Technologies AG</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Schnabel, Rainer Florian</au><au>Sommer, Michael Bernhard</au><aucorp>Infineon Technologies AG</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Semiconductor component with a MOS transistor</title><date>2008-04-08</date><risdate>2008</risdate><abstract>The source area is highly doped, like the channel area, for the same conductance type. The drain area is doped for the opposite conductance type. This results in a saving of area since the source connection (S) can at the same time be used as the well connection or substrate connection.</abstract><oa>free_for_read</oa></addata></record>
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title Semiconductor component with a MOS transistor
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-19T07%3A57%3A37IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Schnabel,%20Rainer%20Florian&rft.aucorp=Infineon%20Technologies%20AG&rft.date=2008-04-08&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E07355218%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true