Semiconductor component with a MOS transistor

The source area is highly doped, like the channel area, for the same conductance type. The drain area is doped for the opposite conductance type. This results in a saving of area since the source connection (S) can at the same time be used as the well connection or substrate connection.

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Bibliographische Detailangaben
Hauptverfasser: Schnabel, Rainer Florian, Sommer, Michael Bernhard
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The source area is highly doped, like the channel area, for the same conductance type. The drain area is doped for the opposite conductance type. This results in a saving of area since the source connection (S) can at the same time be used as the well connection or substrate connection.