Gradient low k material

A thin film dielectric layer comprises a top portion and a bottom portion and has density and permittivity characteristics that vary substantially uniformly from the top portion to the bottom portion. Control over the density and/or permittivity is accomplished through varying deposition parameters...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Li, Lih-Ping, Jang, Syun-Ming
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A thin film dielectric layer comprises a top portion and a bottom portion and has density and permittivity characteristics that vary substantially uniformly from the top portion to the bottom portion. Control over the density and/or permittivity is accomplished through varying deposition parameters such as flow rate of constituent process gases or deposition chamber pressure, or through a post deposition treatment, such as plasma treatment or curing.