Chemical mechanical polishing apparatus with rotating belt

Chemical mechanical polishing apparatus with rotating belt

A chemical mechanical polishing apparatus has a movable platen, a drive mechanism and a chucking mechanism. The drive mechanism is attached to the platen, is configured to support a generally linear polishing sheet with a portion of the polishing sheet extending over the platen, and is configured to...

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Hauptverfasser: Birang, Manoocher, Rosenberg, Lawrence M, Somekh, Sasson, White, John M
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Sprache:eng
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creator Birang, Manoocher
Rosenberg, Lawrence M
Somekh, Sasson
White, John M
description A chemical mechanical polishing apparatus has a movable platen, a drive mechanism and a chucking mechanism. The drive mechanism is attached to the platen, is configured to support a generally linear polishing sheet with a portion of the polishing sheet extending over the platen, and is configured to incrementally advance the polishing sheet in a linear direction relative to the platen. The chucking mechanism is configured to intermittently secure the portion of the polishing sheet to the platen.
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The drive mechanism is attached to the platen, is configured to support a generally linear polishing sheet with a portion of the polishing sheet extending over the platen, and is configured to incrementally advance the polishing sheet in a linear direction relative to the platen. The chucking mechanism is configured to intermittently secure the portion of the polishing sheet to the platen.</abstract><oa>free_for_read</oa></addata></record>
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title Chemical mechanical polishing apparatus with rotating belt
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