Chemical mechanical polishing apparatus with rotating belt

A chemical mechanical polishing apparatus has a movable platen, a drive mechanism and a chucking mechanism. The drive mechanism is attached to the platen, is configured to support a generally linear polishing sheet with a portion of the polishing sheet extending over the platen, and is configured to...

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Bibliographische Detailangaben
Hauptverfasser: Birang, Manoocher, Rosenberg, Lawrence M, Somekh, Sasson, White, John M
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A chemical mechanical polishing apparatus has a movable platen, a drive mechanism and a chucking mechanism. The drive mechanism is attached to the platen, is configured to support a generally linear polishing sheet with a portion of the polishing sheet extending over the platen, and is configured to incrementally advance the polishing sheet in a linear direction relative to the platen. The chucking mechanism is configured to intermittently secure the portion of the polishing sheet to the platen.