Positive resist composition and pattern formation method using the same
A positive resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid and (B-1) a compound having a structure represented by formula (I) defined in the specification.
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A positive resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid and (B-1) a compound having a structure represented by formula (I) defined in the specification. |
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