Nano-imprinted photonic crystal waveguide

This invention relates to a method for forming a nano-imprinted photonic crystal waveguide, comprising the steps of: preparing an optical film on a substrate; preparing a template having a plurality of protrusions of less than 500 nm in length such that the protrusions are spaced a predetermined dis...

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Bibliographische Detailangaben
Hauptverfasser: Ellenson, James E, Hostetler, Timothy S, Tong, William M
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:This invention relates to a method for forming a nano-imprinted photonic crystal waveguide, comprising the steps of: preparing an optical film on a substrate; preparing a template having a plurality of protrusions of less than 500 nm in length such that the protrusions are spaced a predetermined distance from each other; heating the film; causing the template to press against the heated film such that a portion of the film is deformed by the protrusions; separating the template from the film; and etching the film to remove a residual layer of the film to form a nano-imprinted photonic crystal waveguide. Another embodiment of this invention fulfills these needs by providing a method for forming a nano-imprinted photonic crystal waveguide, comprising the steps of: a method for forming a nano-imprinted photonic crystal waveguide, comprising the steps of: preparing an optical film upon a substrate; preparing a template having a plurality of protrusions of less than 500 nm in length such that the protrusions are spaced a predetermined distance from each other; causing the template to modify a shape of the film; applying a UV light to the film and the template such that the film becomes polymerized; separating the template from the film; and etching the film to remove a residual layer of the film to form a nano-imprinted photonic crystal waveguide.