Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory
A magnetoresistance effect element includes a first ferromagnetic layer, insulating layer overlying the first ferromagnetic layer, and second ferromagnetic layer overlying the insulating layer. The insulating layer has formed a through hole (A) having an opening width not larger than 20 nm, and the...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | Okuno, Shiho Ohsawa, Yuichi Haneda, Shigeru Kamiguchi, Yuzo Kishi, Tatsuya |
description | A magnetoresistance effect element includes a first ferromagnetic layer, insulating layer overlying the first ferromagnetic layer, and second ferromagnetic layer overlying the insulating layer. The insulating layer has formed a through hole (A) having an opening width not larger than 20 nm, and the first and second ferromagnetic layers are connected to each other via the through hole. |
format | Patent |
fullrecord | <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_07265950</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>07265950</sourcerecordid><originalsourceid>FETCH-uspatents_grants_072659503</originalsourceid><addsrcrecordid>eNqNi7sKAjEQRdNYiPoP8wErLMoqW4tiY2cvQzKJgTyWzKTw793Agq3VgXvPWavwQJdIciH2LJg0AVlLWoACRUrSgReGiKla1FKLTw4iyTubbl5b6zUUmko2Vbdz6QCT-QmRYi6frVpZDEy7hRsFt-vzct9XnlDmiF-uYEN_PpyGceiPfyhfQAJDfQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory</title><source>USPTO Issued Patents</source><creator>Okuno, Shiho ; Ohsawa, Yuichi ; Haneda, Shigeru ; Kamiguchi, Yuzo ; Kishi, Tatsuya</creator><creatorcontrib>Okuno, Shiho ; Ohsawa, Yuichi ; Haneda, Shigeru ; Kamiguchi, Yuzo ; Kishi, Tatsuya ; Kabushiki Kaisha Toshiba</creatorcontrib><description>A magnetoresistance effect element includes a first ferromagnetic layer, insulating layer overlying the first ferromagnetic layer, and second ferromagnetic layer overlying the insulating layer. The insulating layer has formed a through hole (A) having an opening width not larger than 20 nm, and the first and second ferromagnetic layers are connected to each other via the through hole.</description><language>eng</language><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7265950$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,776,798,881,64015</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7265950$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Okuno, Shiho</creatorcontrib><creatorcontrib>Ohsawa, Yuichi</creatorcontrib><creatorcontrib>Haneda, Shigeru</creatorcontrib><creatorcontrib>Kamiguchi, Yuzo</creatorcontrib><creatorcontrib>Kishi, Tatsuya</creatorcontrib><creatorcontrib>Kabushiki Kaisha Toshiba</creatorcontrib><title>Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory</title><description>A magnetoresistance effect element includes a first ferromagnetic layer, insulating layer overlying the first ferromagnetic layer, and second ferromagnetic layer overlying the insulating layer. The insulating layer has formed a through hole (A) having an opening width not larger than 20 nm, and the first and second ferromagnetic layers are connected to each other via the through hole.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNqNi7sKAjEQRdNYiPoP8wErLMoqW4tiY2cvQzKJgTyWzKTw793Agq3VgXvPWavwQJdIciH2LJg0AVlLWoACRUrSgReGiKla1FKLTw4iyTubbl5b6zUUmko2Vbdz6QCT-QmRYi6frVpZDEy7hRsFt-vzct9XnlDmiF-uYEN_PpyGceiPfyhfQAJDfQ</recordid><startdate>20070904</startdate><enddate>20070904</enddate><creator>Okuno, Shiho</creator><creator>Ohsawa, Yuichi</creator><creator>Haneda, Shigeru</creator><creator>Kamiguchi, Yuzo</creator><creator>Kishi, Tatsuya</creator><scope>EFH</scope></search><sort><creationdate>20070904</creationdate><title>Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory</title><author>Okuno, Shiho ; Ohsawa, Yuichi ; Haneda, Shigeru ; Kamiguchi, Yuzo ; Kishi, Tatsuya</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_072659503</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Okuno, Shiho</creatorcontrib><creatorcontrib>Ohsawa, Yuichi</creatorcontrib><creatorcontrib>Haneda, Shigeru</creatorcontrib><creatorcontrib>Kamiguchi, Yuzo</creatorcontrib><creatorcontrib>Kishi, Tatsuya</creatorcontrib><creatorcontrib>Kabushiki Kaisha Toshiba</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Okuno, Shiho</au><au>Ohsawa, Yuichi</au><au>Haneda, Shigeru</au><au>Kamiguchi, Yuzo</au><au>Kishi, Tatsuya</au><aucorp>Kabushiki Kaisha Toshiba</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory</title><date>2007-09-04</date><risdate>2007</risdate><abstract>A magnetoresistance effect element includes a first ferromagnetic layer, insulating layer overlying the first ferromagnetic layer, and second ferromagnetic layer overlying the insulating layer. The insulating layer has formed a through hole (A) having an opening width not larger than 20 nm, and the first and second ferromagnetic layers are connected to each other via the through hole.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_uspatents_grants_07265950 |
source | USPTO Issued Patents |
title | Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T22%3A26%3A12IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Okuno,%20Shiho&rft.aucorp=Kabushiki%20Kaisha%20Toshiba&rft.date=2007-09-04&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E07265950%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |