Stress-relief layer and stress-compensation collar in contact arrays, and processes of making same

A stress-relief layer is formed by dispensing a polymer upon a substrate lower surface under conditions to partially embed a solder bump that is disposed upon the lower surface. The stress-relief layer flows against the solder bump. A stress-compensation collar is formed on a board to which the subs...

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Bibliographische Detailangaben
Hauptverfasser: Suh, Daewoong, Jayaraman, Saikumar, Bin Basiron, Mohd Erwan P, Lim, Sheau Hooi, Chin, Yoong Tatt P
Format: Patent
Sprache:eng
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Zusammenfassung:A stress-relief layer is formed by dispensing a polymer upon a substrate lower surface under conditions to partially embed a solder bump that is disposed upon the lower surface. The stress-relief layer flows against the solder bump. A stress-compensation collar is formed on a board to which the substrate is mated and the SCC partially embeds the solder bump. An article that exhibits a stress-relief layer and a stress-compensation collar is also included. A computing system that includes a stress-relief layer and a stress-compensation collar is also included.