Method and apparatus for high-resolution defect location and classification

In the manufacture of integrated circuits on a wafer, it is necessary to monitor the manufacturing process by inspecting the ICs as to whether errors or defects have occurred during production. It is already known to use a scattered-light device to determine whether a defect is present on the wafer....

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Bibliographische Detailangaben

1. Verfasser:	Wienecke, Joachim
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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