Process for coating substrates using vapour deposition
The invention relates to a process for applying a coating to a substrate wherein the coating is formed of at least two components or elements. In a preferred embodiment, the coating is formed of at least two metals. In accordance with the invention, the coating is applied by vapor deposition under c...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | The invention relates to a process for applying a coating to a substrate wherein the coating is formed of at least two components or elements. In a preferred embodiment, the coating is formed of at least two metals. In accordance with the invention, the coating is applied by vapor deposition under choking conditions. |
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