Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source

A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one of the foil plate surfaces. In ano...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Rettig, Curtis L, Hoffman, Jerzy R, Vargas, Ernesto L
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one of the foil plate surfaces. In another aspect, an electrostatic grid may be positioned for interaction with ions to reduce ion energy, and a magnetic field may be used to deflect the reduced energy ions onto paths wherein the ions do not strike the internal component. In yet another aspect, a grid may be connected to a circuit tuned to a resonant frequency to reduce ion energy. For example, the resonant frequency may be substantially equal to an inverse of a time difference between the time when electrons reach the grid and a subsequent time when ions reach the grid.