Simultaneous measurement of the reflectivity of X-ray with different orders of reflections and apparatus for measurement thereof

Disclosed are an apparatus and a method for simultaneously measuring integrated reflectivity of X-rays with different orders of reflections in crystal. Continuous X-rays are incident into the crystal and reflection intensities of the X-rays reflected from the crystal with different orders of reflect...

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Bibliographische Detailangaben
Hauptverfasser: Lee, Sang Gon, Bak, Jun Gyo, Bitter, Manfred
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Disclosed are an apparatus and a method for simultaneously measuring integrated reflectivity of X-rays with different orders of reflections in crystal. Continuous X-rays are incident into the crystal and reflection intensities of the X-rays reflected from the crystal with different orders of reflections are measured based on Bragg's law, thereby measuring reflectivity of X-rays with different orders of reflections.