Lithographic apparatus, a device manufacturing method, and a fastener for use in a lithographic apparatus
A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a fastener for fastening a first part of the apparatus to a second part of the apparatus. The fastener includes at least one integrated spring. |
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