EUV light source

A laser produced plasma ("LPP") extreme ultraviolet ("EUV") light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, a target trac...

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Bibliographische Detailangaben
Hauptverfasser: Partlo, William N, Bowering, Norbert, Ershov, Alexander I, Fomenkov, Igor V, Myers, David W, Oliver, Ian Roger, Viatella, John, Jacques, Robert N
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
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Beschreibung
Zusammenfassung:A laser produced plasma ("LPP") extreme ultraviolet ("EUV") light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, and a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site.