Using a partial metal level mask for early test results
A method of using special designed wiring level mask(s) to determine product transistor and circuit performance in a chip during the early portion of the product evaluation cycle saves weeks of time that would have been taken by the passage of the wafer through the fab. The method also saves cost du...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A method of using special designed wiring level mask(s) to determine product transistor and circuit performance in a chip during the early portion of the product evaluation cycle saves weeks of time that would have been taken by the passage of the wafer through the fab. The method also saves cost during production by identifying wafers for rework at an early stage. |
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